Fortu Tech is an ISO Certified Corporation located in China and specializes in manufacturing Pure Niobium Target. We have more than 20 years of production experience. Our products are Conflict Free material.
Common specifications | ||||||||
Thickness inch | 0.15 | 0.2 | 0.25 | 0.3 | 0.35 | 0.4 | 0.45 | 0.5 |
Thickness mm | 3.81 | 5.08 | 6.35 | 7.62 | 8.89 | 10.16 | 11.43 | 12.7 |
The Cas No. of Nb target is 7440-03-1.
In terms of chemical properties, the niobium target has excellent corrosion resistance and stable chemical properties. The melting point of the niobium target is very high, which can reach (2468 ℃).
In addition, the niobium target has excellent electrical conductivity and oxidation resistance. It is most commonly used in industries such as magnetron sputtering, integrated circuits and optical coating.
ASTM B393 R04200 Chemical Requirements Niobium Target | ||||||||||||||||||
Element % | C | N | O | H | Zr | Ta | Fe | Si | W | Ni | Mo | Hf | Ti | B | Al | Be | Cr | Co |
Content Maximum % | 0.01 | 0.01 | 0.015 | 0.0015 | 0.02 | 0.1 | 0.005 | 0.005 | 0.03 | 0.005 | 0.01 | 0.02 | 0.02 | 2 ppm | 0.002 | 0.005 | 0.002 | 0.002 |
ASTM B393 R04210 Chemical Requirements Niobium Target | ||||||||||||||
Element % | C | N | O | H | Zr | Ta | Fe | Si | W | Ni | Mo | Hf | Ti | Al |
Content Maximum % | 0.01 | 0.01 | 0.025 | 0.0015 | 0.02 | 0.3 | 0.01 | 0.005 | 0.05 | 0.005 | 0.02 | 0.02 | 0.03 | 0.005 |
The specification of ASTM B393 | |
ASTM B 393 UNS R04200 Type 1 | Reactor grade unalloyed niobium target |
ASTM B 393 UNS R04210 Type 2 | Commercial grade unalloyed niobium target |
ASTM B 393 UNS R04251 Type 3 | Reactor grade niobium alloy containing 1 % zirconium, Nb1Zr target |
ASTM B 393 UNS R04261 Type 4 | Commercial grade niobium alloy containing 1 % zirconium, Nb1Zr target |
ASTM B 393 UNS R04220 Type 5 | RRRR grade pure niobium, RRR Nb target |
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Annealed Condition (90% Minimum Recrystallized)
Mechanical Properties of Nb Target ASTM B393 | |||
Thickness | Ultimate Tensile Strength | Yield Strength | Elongation |
Greater than 0.01" | 18 000 min, psi | 10 500 min, psi | 20% |
Greater than 0.01" | 125 min, Mpa | 73 min, Mpa | 20% |
Cas No. of Nb | 7440-3-1 |
EINECS No.of Nb | 231-113-5 |
Element class of Nb | Transition metal element |
Density of Nb | 8570kg/m3;8.57g/cm3 |
Melting Point of Nb | 2468 ℃ |
Boiling Point of Nb | 4742 ℃ |
Electronegativity of Nb | 1.6 |
Atomic radius of Nb | 146pm |
Thermal Conductivity of Nb | (300 K) 53.7 W·m−1K−1 |
Electrical Resistivityof Nb | (0 °C) 152 nΩ·m |
High-Purity Niobium Sputtering Targets for Advanced Thin-Film Applications: Niobium targets represent a premium-grade material solution for precision thin-film deposition across high-tech industries. Manufactured to exceptional purity standards (99.95%-99.999%), these specialized tantalum sputtering targets leverage niobium's unique combination of ultra-high melting point (2477°C), outstanding corrosion resistance, and superior chemical stability to deliver reliable performance in demanding applications.
In semiconductor manufacturing, niobium targets play a critical role in depositing thin films for integrated circuit production, particularly for gate electrodes and diffusion barrier layers in copper interconnects. The Nb target's low defect density and uniform grain structure ensure high deposition yields, with 5N-6N purity grades available for the most sensitive microelectronic applications. MEMS device manufacturers similarly benefit from niobium's consistent sputtering characteristics and excellent step coverage uniformity.
The optical industry utilizes niobium targets extensively for coating applications, where their controlled refractive index and strong adhesion properties produce durable anti-reflective surfaces on lenses and display components. Through magnetron sputtering techniques, niobium targets also create wear-resistant decorative finishes with superior oxidation resistance compared to conventional coating materials.
The optical industry utilizes niobium targets extensively for coating applications, where their controlled refractive index and strong adhesion properties produce durable anti-reflective surfaces on lenses and display components. Through magnetron sputtering techniques, niobium targets also create wear-resistant decorative finishes with superior oxidation resistance compared to conventional coating materials.
In energy and aerospace applications, niobium targets contribute to advanced thermal management solutions. They deposit protective thermal barrier coatings on turbine blades and create radiation-resistant layers for spacecraft components. Fuel cell manufacturers also employ niobium-sputtered films to enhance component durability and performance.
Available in standard disc (Ø50mm-Ø200mm) and rectangular configurations, niobium targets can be custom-shaped to meet specific equipment requirements. All products undergo rigorous quality control to density and are offered with optional polished surfaces or pre-bonded backing plates for immediate integration into sputtering systems. Niobium targets are produced using hot isostatic pressing (HIP) technology to achieve optimal columnar grain structure for consistent film deposition.
Technical support is available to help select the ideal niobium target configuration for your specific application, whether for high-volume semiconductor production or specialized research purposes. Our engineering team can provide guidance on sputtering parameters, bonding options, and purity specifications to maximize your thin-film coating results.
In addition to Niobium Target, we also produce Niobium Tube & Pipe, Niobium Sheet & Plate, Niobium Foil & Strip, Niobium Rod & Bar, Niobium Ingot, Niobium Pellets, Niobium Wire, Niobium Disc, Niobium Shield, Niobium machined parts, Niobium Spherical Powder. They meet Standard ASTM B 394 R04200, ASTM B 394 R04210, ASTM B 393 R04200, ASTM B 393 R04210, ASTM B 392 R04200, ASTM B 392 R04210, ASTM B 391 R04200, ASTM B 391 R04210.
Add: 399 Chunhe Road, Baoshan District, Shanghai, China, 200941
Tel: +86 21 56656030
Email: info@fortu-tech.com